How photoresist is made
Photoresist is a liquid that hardens or dissolves where light hits it, and that lets chips be drawn with light.
- stations
- 6
- things upstream
- 14
- raw sources
- 5
- steps from the ground
- 7
The short version
Conventional photoresist has three parts: a resin binder, a photoactive sensitizer and a solvent that keeps it liquid. Makers prepare and refine the resin, dissolve each component in solvent, and combine the solutions in a mixing vessel. The raw liquid then passes through fine plastic filters, sometimes twice, because stray particles and by-products leave defects in the printed pattern.
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Prepare the resin
Resists for g-line and i-line lithography use novolak, a resin made by condensing phenols or cresols with formaldehyde. Far-ultraviolet resists use polymers with groups that an acid can cleave off.
Goes in -
Refine the crude polymer
Unwanted short and overlong chains left over from polymerization cause scum and bridging in the final pattern. One patent dissolves the crude resin at a lower strength than the finished resist uses, then filters it to remove them.
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Dissolve each component
Resin goes into one portion of solvent and the light-sensitive agent into another. Far-ultraviolet types carry an acid generator and a quencher instead. Solvents named in one patent include ethyl lactate and 2-heptanone.
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Combine in a mixing vessel
The separate solutions run through their own valves into one vessel and are mixed until uniform. A patent diagram shows this as the first stage of the production apparatus.
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Filter out fine particles
Filters of fluorine-based resin or polyolefin catch the particles, with pores of roughly 0.01 to 1 µm. Some lines hold the liquid in a tank between two filter stages. Clogging is the running cost, so one patent back-washes filters with solvent.
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Wash down between batches
Using the same equipment for the next batch risks carrying over components and raising particle counts. One patent rinses with the resist solvent, a different solvent able to dissolve the residue, then the resist solvent again.
Worth repeating
- A positive photoresist is weakened by light and a negative one is toughened by it.
- Photoresist is used in photoengraving as well as chip photolithography.
Back to the ground
Follow every input upstream and photoresist starts as these 5 raw sources.
Where it goes next
Photoresist feeds 6 lines directly and reaches 51 things in total.
Further down the line
Keep walking
Sources
- Photoresist
- US7264912B2, Method of producing photoresist
- US7276575, Process for refining crude resin for resist
Cite this page: "How photoresist is made." Assembly Line, 2026-11-03. https://assemblyline.org/make/photoresist